Welcome to Journal of Microelectronic Manufacturing!
2021
Volume 4, Issue 2
  • Published: June 30, 2021
  • Supervised by:None
  • Hosted by:None
  • Published by:JoMM Editorial Office

Research Article top

New Progress of China's Integrated Circuit Design Industry
Keywords:IC industry; Integrated Circuit Design Market
doi:10.33079/jomm.21040203
Issue 2: 21040203, 2021 | PDF
Research Article
Published: June 30, 2021
Views:1429
Abstract: China's IC industry has been flourishing in recent years, huge market demand together with government investments are the major driving forces for this development. The status and development momen...
Improvement of Environment Stability of an i-Line Chemically Amplified Photoresist
Authors: Haibo Li, Qian Yang, Jia Sun et al.
Keywords:Chemical amplification;thick film;i-Line;environment stability;Poly (p-hydroxyl styrene);PAB;PEB
doi:10.33079/jomm.21040201
Issue 2: 21040201, 2021 | PDF
Research Article
Published:
Views:1349
Abstract: An i-Line chemically amplified (ICA) thick film positive resist is reported in this paper. The impact of process conditions on photoresist performance was investigated. Pre-apply bake temperature a...
Patterning with Organized Molecules
Authors: Mark Neisser
Institution:Tan Kah Kee Innovation Laboratory
Keywords:Stochastics;Self-assembly;overlay;edge placement error;self-organizing;DNA origami;bottle brush polymers
doi:10.33079/jomm.21040202
Issue 2: 21040202, 2021 | PDF
Research Article
Published: Aug. 9, 2021
Views:1142
Abstract: Decades of progress in the semiconductor industry has led to lithographically printed dimensions that are small enough that the positions of individual molecules and the stochastic variation in the...