CN: DemoJournal-CN
ISSN: DemoJournal-ISSN
Research Article Current Issue • Versions 2 Vol 3 (4) : 20030407 2020
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Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN
Xuelong Shi, Yan Yan, Tao Zhou, Xueru Yu, Chen Li, Shoumian Chen, Yuhang Zhao
： 2020 - 09 - 28
： 2020 - 12 - 15
： 2020 - 12 - 30
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CSCD  ·  Badiu Scholar
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Journal of Microelectronic Manufacturing

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