CN: DemoJournal-CN
ISSN: DemoJournal-ISSN
Research Article Archive • Versions 3 Vol 2 (3) : 19020406 2019
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A Simulation Study for Typical Design Rule Patterns in 5 nm Logic Process with EUV Photolithographic Process
Yanli Li, Qiang Wu, Shoumian Chen
： 2019 - 10 - 17
： 2019 - 12 - 25
2259 42 0
CSCD  ·  Badiu Scholar
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Journal of Microelectronic Manufacturing

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