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Vol 2 (1) : 19020103 2019
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Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study
Du Zhang
,
Yu-Hao Tsai
,
Hojin Kim
,
Mingmei Wang
DOI:
10.33079/jomm.19020103
: 2019 - 02 - 21
: 2019 - 03 - 22
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